Atomic Layer Deposition

Nano-Fabrication > Atomic Layer Deposition

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• ALD film deposition for IC components, MEMS devices, displays, LEDs, lasers, and 3D objects such as lenses, optics, and medical implants.
• Up to 8” wafers, 156×156 mm solar Si wafers, 3D objects and powders
• Thermal and Plasma ALD
• Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZnO, ZrO2, AlN, TiN, metals such as Pt or Ir